1．經(jīng)典的光刻技術(shù)

適合硅、玻璃、石英等材料，與傳統(tǒng)的半導體工業(yè)的方法一致。

分為濕法和干法兩種，干法的分辨率較濕法高，相應的制造成本也高。

Photolithograph procedures for making glass template. (a) Spine coating of photoresist, (b) covered with photo mask, (c) exposure, (d) developing, (e) etching, and (f) removal of photoresist.

2．模版澆注法（模塑法）

適合聚合物材料。

 大批量生產(chǎn)時成本低

Process overview for mass manufacturing of plastic microfluidic systems

3．模版熱壓法

適合熱塑性聚合物

Schematic representation of the fabrication method involving hotembossing of thermoplastic polymer pellets and thermal bonding.

4．激光刻蝕法

用激光直接在聚合物或玻璃上加熱形成微結(jié)構(gòu)